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EPI Chip (epitaxial chip)

The epitaxial film is used as the carrier, and the special product characteristics are obtained by diffusion and glass passivation. The oscillations of the TRR waveform are smaller and the application interference is small.

Epitaxial film is a monocrystalline silicon sheet which is grown on the surface of the substrate by an epitaxial process. The epitaxial film is used as the carrier, and the special product characteristics are obtained by diffusion and glass passivation. The oscillations of the TRR waveform are smaller and the application interference is small.

It can meet the customer's long time work demand under the bad conditions such as high temperature, high humidity, strong electric field and so on.




Parameter configuration table

Dimension
Part number

A

B

C

D

Limits ±12

Limits ±2

Limits ±3

Limits ±1

1A

50

12

27

2

2~4A

64

12

41

2

3~6A

72

12

49

2

5~8A

84

12

61

2

8~10A

95

12

72

2


Parameter

Symbol

SF50

SF64

SF72

SF84

SF95

Unit

Peak Inverse V

PIV

100 ~ 800

Volts

Forward Current

IF

1

3

5

8

10

Amps

Forward Volts

VF

PIV200V VF spec. 0.9

PIV400V VF spec. 1.25

PIV600V VF spec. 1.7

PIV800V VF spec. 2.2

Volts

Reverse recovery time

TRR

20~35

ns

Surge Current

IFSM

30

100

125

Amp/8.3ms

Leakage at 100℃

IRFM

400

uA

Junction Temp

TJ,MAX

150

Degrees ℃

Leakage 25℃

IRFM

10.0

uA

Storage Temp

TST

-65 ------- 150

Degrees ℃

Die Attach Temp

TD

340~375

Degrees ℃/2 min

Our company provides PG photolithography process;

Guest system requirements for electrical properties;
Low temperature rise product;
High power products;
White / gold diffusion products;